Semiconductor stocker systems and methods

ABSTRACT

In an embodiment, the present invention discloses cleaned storage processes and systems for high level cleanliness articles, such as extreme ultraviolet (EUV) reticle carriers. A decontamination chamber can be used to clean the stored workpieces. A purge gas system can be used to prevent contamination of the articles stored within the workpieces. A robot can be used to detect the condition of the storage compartment before delivering the workpiece. A monitor device can be used to monitor the conditions of the stocker.

This application is a continuation of U.S. patent application Ser. No.15/383,734, filed on Dec. 19, 2016 which is a continuation of U.S.patent application Ser. No. 13/537,016, filed on Jun. 28, 2012 (now U.S.Pat. No. 9,524,892), claims priority from and the benefit of U.S.Provisional Patent Application No. 61/501,792, filed on Jun. 28, 2011,the disclosures of which are incorporated herein by reference in theirentireties

This invention relates to apparatuses and methods for storing workpiecesor workpiece containers, such as wafer or reticle carriers used in thesemiconductor fabrication industry.

BACKGROUND

Stockers generally are installed within a semiconductor facility fortemporarily storing workpieces, such as wafers, flat panel displays,LCD, photolithography reticles, or masks. In the process ofmanufacturing semiconductor devices, LCD panels, and others, there arehundreds of processing equipments and thus hundreds of manufacturingsteps. It is very difficult for the flow of the wafers, flat panels, orLCDs (hereafter workpiece) to be uniform from step to step, from tool totool. Despite the best planners, there is always the unexpectedscenario, such as a tool down, an emergency lot coming through, aperiodic maintenance lasting longer than planned, thus there are variousaccumulations of the workpieces at certain steps for certain tools. Theaccumulated workpieces will need to be stored in a storage stocker,waiting to be processed.

For example, photolithography process is a critical process in thesemiconductor fabrication facility, involving a large number ofphotolithography masks or reticles (hereinafter reticle). The reticlesthus are typically stored in a storage stocker, and being retrieved whenneeded into the lithography exposure equipment.

The storage of workpieces and reticles (hereafter articles) is much morecomplicated due to the requirement of cleanliness. Damages to thearticles can be physical damages in the form of particles, or chemicaldamages, in the form of interactions. With the critical dimension of thesemiconductor device processing surpassing 0.1 micron, particles of 0.1micron size, and reactive species will need to be prevented fromapproaching the articles. The storage areas typically would need to beeven cleaner than the processing facility, to ensure less cleaningbetween processing.

Thus the stocker storage areas is typically designed to be sealed offfrom the outside environment, preferably with constant purging, and evenwith inert gas flow to prevent possible chemical reactions. Access tothe storage areas is load-locked, to ensure isolation between the cleanstorage environment and the outside environment.

With advances in semiconductor devices and processing, the requirementsfor cleanliness in modern semiconductor factories rise, for example,increased requirements for cleanliness in storage stockers.

SUMMARY

In an embodiment, the present invention discloses cleaned storageprocesses and systems for high level cleanliness articles, such asextreme ultraviolet (EUV) reticle carriers. A decontamination chambercan be used to clean the stored workpieces. A purge gas system can beused to prevent contamination of the articles stored within theworkpieces. A robot can be used to detect the condition of the storagecompartment before delivering the workpiece. A monitor device can beused to monitor the conditions of the stocker.

BRIEF DESCRIPTION OF THE DRAWINGS

FIGS. 1A-1B illustrate configurations of a stocker system according toan embodiment of the present invention.

FIGS. 2A-2B illustrate an example of a decontamination process accordingto a embodiment of the present invention.

FIGS. 3A-3B illustrate different configurations for a decontaminationsystem according to an embodiment of the present invention.

FIGS. 4A-4B illustrate flowcharts for decontaminating objects using adecontamination chamber according to an embodiment of the presentinvention.

FIGS. 5A-5B illustrate other flowcharts for decontaminating objectsusing a decontamination chamber according to an embodiment of thepresent invention.

FIGS. 6A-6C illustrate flowcharts for decontaminating objects in astocker using a decontamination chamber according to an embodiment ofthe present invention.

FIG. 7 illustrates a storage chamber including a number of storagecompartments according to an embodiment of the present invention.

FIG. 8 illustrates a stocker system using purged gas storagecompartments according to an embodiment of the present invention.

FIGS. 9A-9C illustrate flowcharts for storing objects using purge gascompartments according to an embodiment of the present invention.

FIGS. 10A-10E illustrate a robot arm having a flow sensor according toan embodiment of the present invention.

FIGS. 11A-11B illustrate sensor configurations on the gripper armsaccording to an embodiment of the present invention.

FIGS. 12A-12D illustrate a flow detection sequence according to anembodiment of the present invention.

FIGS. 13A-13B illustrate flowcharts for sensing purge gas flow beforeplacing objects according to an embodiment of the present invention.

FIG. 14A illustrates a monitor carrier according to an embodiment of thepresent invention.

FIG. 14B illustrates movements of the monitor carrier is a stocker.

FIGS. 15A-15C illustrate flowcharts for data collecting from a monitorcarrier according to an embodiment of the present invention.

FIG. 16A illustrates a system including a data collection stationaccording to an embodiment of the present invention.

FIG. 16B illustrates a flowchart for data collection station accordingto an embodiment of the present invention.

FIG. 17 illustrates an exemplary configuration for overhead and manualloading stations according to an embodiment of the present invention.

FIGS. 18A-18B illustrate exemplary flowcharts for accessing overheadloading stations according to an embodiment of the present invention.

FIG. 19 illustrates an exemplary transfer and/or storage station havingpurge nozzles according to an embodiment of the present invention.

FIG. 20 illustrates a configuration of a EUV reticle carrier.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

In some embodiments, the present invention discloses methods andapparatuses for storage of objects, such as semiconductor workpiececontainers and reticle carriers. In an embodiment, the storage processcan include a clean environment for storage with purge gas to innervolume of stored objects, and a decontamination chamber for periodicallyclean the stored objects.

Cleanliness is a critical requirement for semiconductor articles such ascassettes, FOUP, holders, carriers, etc. In cleaned storage, a cleanenvironment maintains a level of cleanliness, such as reduction ofparticles in the range of few microns down to sub-micron levels andreduction of trace contaminants, organic, inorganic metals, native oxideand particulate matters.

In an embodiment, the present invention discloses cleaned storageprocesses and systems for high level cleanliness articles, such asextreme ultraviolet (EUV) reticle carriers. The following descriptionuses EUV reticle carriers are example, but the invention is not solimited, and can be applied toward any objects having stringentcleanliness requirements, such as low particulate contaminations and lowoutgassing components.

FIG. 20 illustrates a configuration of a EUV reticle carrier 209 to bestored. A EUV reticle 200 is typically stored in double-containercarrier 209, together with having nitrogen in the space 207 between theinner container and the outer container. An inner container is typicallymade of metal, comprising an upper lid 201 mated with a lower support202. An outer container is typically made of low outgassing polymer,comprising an upper lid 203 mated with a lower support 204. Bothcontainers can have handles for holding by an operator or by anautomatic transport system. A handle 205 is shown for the upper lid 203of the outer container. The support 204 of the outer container can haveinlets for accepting nitrogen purge to the inner volume 207 of thereticle carrier.

The double container euv reticle carrier is an example of the high levelof cleanliness for semiconductor processing, where the reticle is storedin two levels of container to prevent contamination. In addition, thevolume between the two levels is purged with nitrogen to avoid bacteriagrowth, or to prevent outgassing particles from the outer container toattach to the inner container. Thus a stored system for such cleanedobjects requires improved features to maintain the desired level ofcleanliness.

In an embodiment, the present invention discloses a cleaning chamber andprocess to periodically purge, clean, or outgassing the stored objects.The cleaning chamber can restore the cleanliness of the stored object,for example, by outgassing any contaminants adhering to the objectsduring the storage. The periodic cleaning can reduce or eliminate anycontamination, restoring the objects back to a high level ofcleanliness.

In an embodiment, the cleaning chamber can include a decontaminationchamber, employing high vacuum for performing outgassing of contaminantson the objects. The objects to be stored can undergo decontaminationbefore placing into storage. The stored objects can be decontaminatedbefore taken out of the stocker. The stored objects can bedecontaminated following certain procedures, such as after a certaintime, when the objects become dirty, or when there is some concern aboutthe level of cleanliness for the stocker.

In an embodiment, the decontamination process employs high vacuum, suchas at or lower than 10⁻⁶ Torr, to release any trapped contaminants onthe surface or subsurface of the objects. In addition, the volume insidethe objects can be evacuated, for example, at the same high vacuumlevel. Furthermore, purging processes can be performed to the insidevolume, further removing any particulates and contaminants within theobjects.

In an embodiment, the objects are decontaminated while being closed,with the inside volume pumped and/or pumped/purged with clean nitrogen.In another embodiment, the objects are decontaminated while beingopened, thus all parts of the objects are subjected to a high level ofvacuum for releasing any trapped contaminants.

FIGS. 1A-1B illustrate configurations of a stocker system according toan embodiment of the present invention. The stocker can include astorage chamber 12, a loading and unloading station 18, and a transfersystem 16 for transferring objects between the loading/unloading station18 and the storage chamber 12. In addition, the stocker can also includea decontamination chamber 14 for cleaning the stored objects. Thedecontamination chamber 14 can be located opposite (FIG. 1A) or next tothe storage chamber 12 (FIG. 1B). Alternatively, the decontaminationchamber 14 can be located anywhere within the stocker system, forexample, within access of the transfer robot 16.

FIGS. 2A-2B illustrate an example of a decontamination process accordingto an embodiment of the present invention. The object shown to bedecontaminated is a double container reticle carrier, including an outercontainer 22B and an inner container 22A protecting a reticle 21. Thedecontamination chamber 20 can include a vacuum pump 25 for maintaininga vacuum within the decontamination chamber 23A, a gas purge system 26including a clean, inactive or inert gas such as nitrogen or compressedair for establishing a pressurized chamber, one or more manifolds 28coupled to the inside volume of the object, for example, volume 23Bbetween the outer container 22B and the inner container 22A. Themanifolds 28 are coupled to a pumping line 29B for evacuate the insidevolume and a purge gas 29A for purging the inside volume. A heater 24can be included for heating the object and/or the decontaminationchamber. A sensor, such as a RGA (residue gas analyzer), can also beincluded to monitor levels of contamination of the object.

In FIG. 2A, a vacuum volume 23A is established by the vacuum pump 25(for example, by shut down flow 26, together with a vacuum volume 23Binside the object, established by the manifolds 28 switching to pumpingline 29B. Heater 24 and RGA 27 can be turned on. The time fordecontamination can set predetermined, or can be set by the level ofcontaminants observed by the sensor 27. In FIG. 2B, after completing thevacuum decontamination, the vacuum is turned off, and the purge gas 26is turned on to establish a pressurized environment 23A* in thedecontamination chamber. Further, the manifolds 28 is switched to purgedgas 29A to flowing purge gas to the inside volume 23B*. The pressurizedambient can be established before opening the decontamination chamber 20to atmosphere, for example, before taking the object out of thedecontamination chamber. The pressurized ambient can prevent backtrapping of contaminants and particulates to the object surface.

In an embodiment, during vacuum decontamination phase (FIG. 2A), themanifolds 28 can be cyclically switching between pumping and purging,effectively performing pump/purge cycles to clean the inside volume 23B.

FIGS. 3A-3B illustrate different configurations for a decontaminationsystem according to an embodiment of the present invention. In FIG. 3A,the outer container 22B is opened during decontamination. In this case,the manifolds 28 can be coupled directly to the purging line 29A, sincethe inside volume can be pumped through the decontamination chamber 23.Decontamination process is performed as before, with the vacuumproviding outgassing process for the trapped contaminants, together withheater 24 and sensor 27. Purge gas is shut off, such as purge gas 26 forthe chamber and purge 29A for the container. After completing thedecontamination process, the purge gas 26 can be introduced to establisha pressurized ambient, in addition to the purge 29A for filling theinside volume. The outer container can be closed under the cleanenvironment with the purge gas 29A, before the complete object releasedto the outside ambient.

In FIG. 3B, both inner and outer containers are opened duringdecontamination. The inner and outer containers are closed under purgegas ambient before releasing the closed object to the outside.

FIGS. 4A-4B illustrate flowcharts for decontaminating objects using adecontamination chamber according to an embodiment of the presentinvention. In an embodiment, the outside of the carrier is subjected toa vacuum outgassing process, and the volume within the carrier issubjected to a pumped/purge process. The pumped/purge process can be avacuum pumping for outgassing, which follows by a clean gas purge.Alternatively, the pumped/purge process can comprise multiple cycles ofpumping and purging. In FIG. 4A, operation 40 evacuates gases in thedecontamination chamber to decontaminate a carrier. Operation pumps andpurges the gases within the carrier, one or multiple cycles. Operation42 flows nitrogen to the decontamination chamber before removing thecarrier.

In an embodiment, the volume within the carrier is optionally pumpedout. For example, if the time between decontamination is short, meaningthe clean gas within the carrier is still very clean with minimal ornegligible contaminants adhering to the object inside the inner volume,then an outgassing of the inner volume might not be needed. In mostcases, the clean gas (e.g., nitrogen, within the carrier is replacedwith a new clean gas, for example, by a purge process of the insidevolume. In FIG. 4B, operation 43 transfers a carrier to adecontamination chamber. Operation 44 evacuates gases in thedecontamination chamber. Operation 45 optionally evacuates gases withinthe carrier. Operation 46 flows nitrogen to the volume within thecarrier. Operation 47 flows nitrogen to the decontamination chamber.Operation 48 transfers the carrier out of the decontamination chamber.

FIGS. 5A-5B illustrate other flowcharts for decontaminating objectsusing a decontamination chamber according to an embodiment of thepresent invention. In an embodiment, the carrier is opened fordecontaminating the outside and the inside of the carrier. For example,an outer container is opened for decontaminating the volume between theouter and the inner volume. The innermost volume is still closed toprotect the reticle. In FIG. 5A, operation 50 transfers a carrier to adecontamination chamber. Operation 51 flows nitrogen to thedecontamination chamber. Operation 52 opens an outer container of thecarrier. Operation 53 evacuates gases in the decontamination chamber.Operation 54 flows nitrogen to the decontamination chamber. Operation 55flows nitrogen to the inner volume of the carrier. Operation 56 closesthe outer container of the carrier. Operation 57 removes the carrier.

In an embodiment, both outer and inner containers are opened fordecontamination. Thus the above sequence can be used with operation 52and 56 modified to 52A and 56A. In FIG. 5B, operation 52A opens an outercontainer and an inner container of the carrier. Operations 53 to 55 aresimilar with operation 53 evacuates gases in the decontaminationchamber; operation 54 flows nitrogen to the decontamination chamber; andoperation 55 flows nitrogen to the inner volume of the carrier.Operation 56A closes the inner container and the outer container of thecarrier.

FIGS. 6A-6C illustrate flowcharts for decontaminating objects in astocker using a decontamination chamber to an embodiment of the presentinvention. In an embodiment, the objects stored in a stocker areperiodically or occasionally brought to a cleaning chamber (such as adecontamination chamber) for cleaning or conditioning. In FIG. 6A,operation 60 stores carriers in a storage chamber. Operation 61periodically brings a carrier to a decontamination chamber fordecontaminating. Operation 62 returns the decontaminated carrier back tothe storage.

In an embodiment, the objects are cleaned or decontaminated beforebrought into the stocker. In FIG. 6B, operation 63 loads a carrier to astocker load port. Operation 64 transfers the carrier to adecontamination chamber for decontaminating. Operation 65 stores thecarrier in a storage of the stocker.

In an embodiment, the objects are cleaned or decontaminated before takenout of the stocker. In FIG. 6C, operation 66 stores carriers in astorage of a stocker. Operation 67 transfers the carrier to adecontamination chamber for decontaminating. Operation 68 transfers thedecontaminated carrier to a load port of the stocker.

In some embodiments, the present invention discloses a decontaminationchamber for decontaminating a workpiece. The workpiece can include afirst container for storing an article. The first container can bestored within a second container. For example, the workpiece can be acarrier for a euv reticle. The decontamination chamber can include asupport for supporting the workpiece. The support can include the wallof the chamber. The support can include a pedestal. The decontaminationchamber can include a first pumping mechanism, wherein the first pumpingmechanism is coupled to the decontamination chamber. The first pumpingmechanism can include a pump, such as a turbo pump or a cryo pump. Thepumping mechanism can include a high speed pumping system for fastthroughput. The decontamination chamber can include a first gas deliverysystem for delivering an inactive gas to the decontamination chamber.The first delivery system can include a shut off valve to terminate thegas flow. The decontamination chamber can include a second pumpingmechanism, wherein the second pumping mechanism is coupled to theworkpiece, wherein the second pumping mechanism is configured to pumpthe volume between the first container and the second container. Thedecontamination chamber can include a second gas delivery system,wherein the second gas delivery system is coupled to the workpiece,wherein the second gas delivery system is configured to deliver aninactive gas to the volume between the first container and the secondcontainer. In some embodiments, the decontamination chamber can includenozzles that connect the workpiece to the second pumping system and thesecond delivery system, for example, through a manifold for switchingbetween pumping and purging. The nozzles can protrude front the outsideof the decontamination chamber to the inside of the decontaminationchamber. For example, the nozzles can be coupled to the support, so thatthe workpiece can be coupled to the nozzles when placed on the support.Alternatively, the nozzles can be disposed anywhere within thedecontamination chamber, and coupled to openings of the workpiece forpumping and purging. In some embodiments, the second pumping mechanismcan be coupled to the nozzles to pump the volume between the firstcontainer and the second container. The second gas delivery system canbe coupled to the nozzles to deliver an inactive gas to the volumebetween the first container and the second container. A manifold can beprovided, wherein the manifold is coupled to the nozzles for switchingbetween delivering an inactive as to the nozzles and to pumping throughthe nozzles. In some embodiments, the decontamination chamber caninclude a first mechanism for opening the second container, wherein theopening of the second container exposes the first container to theambient of the second station. For example, the top portion of thesecond container can be raised up. The decontamination chamber caninclude a second mechanism for opening the first container, wherein theopening of the first container exposes the article to the ambient of thesecond station. For example, the top portion of the first container canbe raised up.

In some embodiments, the present invention discloses a stocker forstoring workpieces. The workpiece can include a first container forstoring an article, wherein the first container is stored within asecond container. The stocker can include a fast station, wherein thefirst station is operable to load or unload a workpiece. The firststation can be a loading station, an unloading station, or a stationfunctioned as a loading and an unloading station. The stocker caninclude a second station, wherein the second station comprises a firstpumping mechanism, wherein the first pumping mechanism is operable toestablish a vacuum ambient within the second station, wherein the secondstation is operable to outgas a workpiece. The second station canoperate as a decontamination chamber, using the vacuum to outgas thesurfaces of the workpiece. The stocker can include a storage chamber,wherein the storage chamber comprises a plurality of compartments forstoring the workpieces. The stocker can include a third station, whereinthe third station comprises a robot mechanism for transferring aworkpiece between the first station, the second station, and the storagechamber.

In some embodiments, to second station can include a gas delivery systemfor delivering an inactive gas to the second station. The second stationcan include a gas delivery system for delivering an inactive gas to thevolume between the first container and the second container. The secondstation can include one or more nozzles protruding from the outside ofthe second station to the inside of the second station, wherein theworkpiece is coupled to the nozzles. The nozzles can be configured todeliver an inactive gas to the volume between the first container andthe second container, or wherein the nozzles are configured to pump thevolume between the first container and the second container. The secondstation can include a second pumping mechanism for pumping the volumebetween the first container and the second container. The second stationcan include a first mechanism for opening the second container, whereinthe opening of the second container exposes the first container to theambient of the second station, wherein the second station furthercomprises a second mechanism for opening the first container, whereinthe opening of the first container exposes the article to the ambient ofthe second station.

In some embodiments, the present invention discloses a method fordecontaminating a workpiece. The workpiece comprises a first containerfor storing an article. The first container can be stored within asecond container. The method can include transferring the workpiece to afirst station, wherein the first station is configured to decontaminatethe workpiece. After the workpiece is disposed in the first station, avacuum can be established within the first station. Further, the volumebetween the first container and the second container can be pumped. Thenthe outgassing of the workpiece is monitored, wherein the outgassing iscaused by the vacuum ambient and by the pumping. After the workpiece iscleaned, for example, by the monitoring showing no or minimalcontamination, such as the monitor shows a constant level ofcontamination, the workpiece can be removed from the first station.Before removing, an inactive gas is flown to the first station. Anactive gas is also flown to the volume between the first container andthe second container. The inactive as can prevent cross contaminationfrom ambient to the cleaned workpiece. Afterward, the workpiece can betransferred out of the first station.

In some embodiments, the method can include opening the first containerand/or opening the second container during the decontamination process.The method can also include transferring the workpiece from a load portto the first station for decontamination before storage, transferringthe workpiece from a storage chamber to the first station fordecontamination after a certain time of storage or when taking theworkpiece out of storage, transferring the workpiece from the firststation to an unload port for taking out of the storage, transferringthe workpiece from the first station to a storage chamber for store theworkpiece after being cleaned.

The above description describes a stocker employing a decontaminationchamber for cleaning stored objects. However, the present invention isnot so limited, and can be equally applied to any cleaning chamber, suchas cryogenic cleaning, gas blasting cleaning cryogenic particlesblasting, laser cleaning, or supercritical liquid cleaning.

In an embodiment, the present invention discloses storage compartmenthaving a purge gas system for keeping clean the inside volume of thestored objects. The purge gas system can deliver nitrogen to the insideof an object, effectively replacing the inside ambient, restoring thecleanliness level, and can eliminate or reduce particulate outgassing.For example, the volume between the outer container and the innercontainer of a double container euv reticle carrier is continuously (orintermittently) purged with nitrogen during storage, so that anycontaminants outgassed from the outer container are removed and notadhering to the inner container.

In an embodiment, the storage chamber can be purged with a laminar flowfor keeping the storage clean, preventing or reducing any contaminantsfrom adhering to the outside of the carrier. For example, clean gas,such as compressed air after filtered, can be introduced to the storagechamber, either from a top portion, or from side portions to reduce oreliminate cross contamination.

In an embodiment, the purge gas can be recirculated, removing any chanceof contamination from outside ambient. The recirculation gas cancomprise inert gas such as nitrogen, or in active gas such as air. Therecirculation gas can be filtered to remove particulates, and can becooled to reduce thermal motions. Thus the inside ambient of the storagecompartment is isolated from the outside ambient, permitting a level ofcleanliness suitable for the stored objects.

FIG. 7 illustrates a storage chamber including a number of storagecompartments according to an embodiment of the present invention. Acentral gas line 74 delivers purge gas to the storage compartments. Inan embodiment, the purge gas delivers 73A/73B purge gas continuously,without any active metering or controlling valves. The purge gas flowcan be predetermined during fabrication, and can have optional meteringvalves for manual adjustment, same for all compartments or different fordifferent compartments, but there can be no active or feedbackcontrolling means. The purge gas can flow a fixed amount of gas,regardless of whether or not an object is located at that compartment.In another embodiment, the purge gas can be actively controlled, forexample, to reduce the loss of purge gas for compartment without anystored object.

The purge gas can deliver clean gas, such as nitrogen, to the insidevolume of the stored object, such as the volume between an outercontainer 72A and an inner container 72B of a double container reticlecarrier. Laminar flow (from outside ambient or from a recirculatedambient) can be delivered to the storage compartments, either for allcompartments from top 71A (or from bottom, not shown), or from sides 71Bfor individual compartments.

FIG. 8 illustrates a stocker system using purged gas storagecompartments according to an embodiment of the present invention. Anobject, such as a double container carrier 81B, can be loaded to aninput loading station, and can be transferred by a robot 84 to a storagecompartment 81A of the stocker 80. In an embodiment, the storage chambercan include a carousel rotatable in a direction 85, so that aninput/output compartment 81A is facing the robot 84.

Each storage compartment 81 can include a purge gas line 83C for purgingan inside volume of the stored carrier. The purge gas can be deliveredfrom a central line 83 to delivered line 83A, distributed to a ring 83B,and then provided to the storage compartments. Since the carousel isrotatable, a rotating seal, such as a ferro fluid seal 82, can becoupled between a fixed input line 83 to a rotating line 83A/83B/83C.Laminar flow 88, either filtered ambient gas or filtered recirculatedgas, is provided to the storage compartments. In an embodiment, theinput loading station is provided with purge gas line 87, to purge theinside volume of the carrier 81B at the loading position.

Similar processes can be used for removing a carrier from the storagecompartments to the loading/unloading station.

FIGS. 9A-9C illustrate flowcharts for storing objects using purge gascompartments according to an embodiment of the present invention. In anembodiment, the carriers can be stored in locations having purge gas tothe inside volume of the carriers. In FIG. 9A, operation 90 transfers acarrier to a stocker. Operation 91 flows nitrogen at a storage locationin the stocker. Operation 92 stores a carrier at the storage location,wherein the carrier is coupled to the nitrogen flow to flow nitrogen tothe inner volume of the carrier.

In an embodiment, each compartment can have a purge gas, and eachcarrier can be loaded to the stocker at a location having a purge gas.In FIG. 9B, a carrier can be transferred to a storage compartment in thestocker through a rotation of the storage carousel. Operation 93transfers a carrier to a stocker load port. Operation 94 rotates astorage carousel of the stocker to an empty storage location. Operation95 flows nitrogen at the empty storage location. Operation 96 transfersthe carrier to the storage location, wherein the carrier is coupled tothe nitrogen flow to flow nitrogen to the inner volume of the carrier.

In an embodiment, each compartment can have a purge gas, and eachcarrier can be unloaded to the load port. In FIG. 9C, a carrier can betransferred to the unload port through a rotation of the storagecarousel. Operation 97 stores carriers in a stocker carousel, whereineach carrier is coupled to a nitrogen flow to flow nitrogen to the innervolume of the carrier. Operation 98 rotates the storage carousel of thestocker to a desired carrier location. Operation 99 transfers thedesired carrier to a stocker load port.

In some embodiments, the present invention discloses a stocker forstoring workpieces. The workpiece can include a first container forstoring an article. The first container can be stored within a secondcontainer. The stocker can include a first station, wherein the firststation is operable to load or unload a workpiece; a storage chamber,wherein the storage chamber comprises a plurality of compartments forstoring the workpieces; a second station, wherein the second stationcomprises a robot mechanism for transferring a workpiece between thefirst station and the storage chamber; a gas delivery system, whereinthe gas delivery system is distributed to one or more nozzles in eachcompartment of the storage chamber, wherein the nozzles are configuredto couple to a workpiece stored in the each compartment to deliver aninactive gas to the volume between the first container and the secondcontainer of the workpiece.

In some embodiments, the gas delivery system delivers the inactive gasto the nozzles with or without a workpiece coupling to the nozzles. Insome embodiments, the stocker can include a mechanism to deliver theinactive gas to the nozzles when a workpiece is coupled to the nozzles;a metering valve coupled to the nozzles to control a flow rate of theinactive gas through the nozzles; a flow mechanism for delivering alaminar flow to the compartments, wherein the laminar flow is providedfrom the top of the storage chamber; a flow mechanism for delivering alaminar flow to the compartments, wherein the laminar flow is providedfrom a side of each individual compartment; a circulation mechanismcoupled to a raised floor for circulating a flow within the storagechamber; and a chiller for cooling the gas within the storage chamber,

In some embodiments, the stocker can include a first station, whereinthe first station is operable to load or unload a workpiece; a first gasdelivery system, wherein the first gas delivery system is coupled to oneor more first nozzles in the first station, wherein the first nozzlesare configured to couple to a workpiece positioned in the first stationto deliver an inactive gas to the volume between the first container andthe second container of the workpiece; a storage chamber, wherein thestorage chamber comprises a plurality of compartments for storing theworkpieces, wherein the compartments are disposed on a rotatablecarousel; a second station, wherein the second station comprises a robotmechanism for transferring a workpiece between the first station and thestorage chamber; a second gas delivery system, wherein the gas deliverysystem is distributed to one or more nozzles in each compartment of thestorage chamber through a rotating seal, wherein the rotating seal isconfigured to couple the second gas delivery system to the rotatablecarousel, wherein the nozzles are configured to couple to a workpiecestored in the each compartment to deliver an inactive gas to the volumebetween the first container and the second container of the workpiece.

In some embodiments, the stocker can include a flow mechanism fordelivering a laminar flow to the compartments, wherein the laminar flowis provided from a side of each individual compartment; a circulationmechanism coupled to a raised floor for circulating a flow within thestorage chamber; a chiller for cooling the gas within the storagechamber; and a decontamination chamber, wherein the decontaminationchamber is operable to decontaminate the workpiece.

In some embodiments, the present invention discloses a method forstoring a workpiece. The workpiece can include a first container forstoring an article. The first container can be stored within a secondcontainer. The method can include transferring the workpiece to acompartment of a storage chamber, wherein the workpiece is coupled toone or more nozzles, wherein the nozzles are configured to deliver aninactive gas to the volume between the first container and the secondcontainer of the workpiece; flowing an inactive gas to the nozzles.

In some embodiments, the method can further include accepting theworkpiece to a load port before transferring the workpiece from the loadport the compartment, wherein the workpiece is coupled to one or moresecond nozzles in the load port, wherein the second nozzles areconfigured to deliver an inactive gas to the volume between the firstcontainer and the second container of the workpiece; flowing an inactivegas to the second nozzles; flowing an inactive gas to the nozzles withor without a workpiece coupling to the nozzles; flowing an inactive gasto the nozzles when a workpiece is coupled to the nozzles; delivering alaminar flow to the compartment, wherein the laminar flow is providedfrom a side of the compartment; delivering a circulating flow to thecompartment through a raised floor; and delivering the circulating flowthrough a chiller.

In an embodiment, the present invention discloses a robot arm to handlethe object during transfer between the storage chamber and the loadport. The robot can include a flow sensor for detecting a purge gas at astorage compartment before storing the object at that location. In anembodiment, the detection can be performed on-the-fly, meaning duringthe path to the storage compartment, thus incurring no transferoverhead. In an embodiment, the detection can be performed in a separateaction, detecting the presence of a purge flow before selecting thestorage compartment.

In an embodiment, a sensor can be used to each purge gas, thus formultiple purge gas system, the robot arm can detect any number ofdefected purge gas nozzles. The sensor can be positioned to be directlyover the purge gas nozzle, thus can reliably detect the presence of gasflow. In an embodiment, the sensor is positioned at an offset from thepurge gas nozzle, for example, when the robot arm is gripping the outeredge of the carrier and the purge gas nozzles are disposed inside theouter edge area.

In an embodiment, a gripper handler with gripper arms can be used tohandle the stored objects, such as the double container carriers. Forexample, the gripper arm can handle the outer container. Alternatively,a gripper arm can handle an overhead handle, designed for overheadtransport system.

FIGS. 10A-10E illustrate a robot arm having a flow sensor according toan embodiment of the present invention. A robot arm 101 can have a flowsensor 102 disposed at an end area of the robot arm, thus can detect aflow 104 during a robot arm movement, and before the carrier 105 reachesthe gas nozzle 103. After detecting the presence of a gas flow at thedesired location, the robot arm can continue its movement forward, stopwhen the carrier reaches the nozzle 103. The robot then can place thecarrier 105 on the purge gas nozzle, allowing purge gas 104A from thenozzle to enter the inside volume 106 of the carrier 105. If a purge gasflow is not detected, the robot arm can move to another storagecompartment, and optionally labeling this location as having defectedpurge gas. The detection can be performed during the path to the desiredstorage location, thus incurring no overhead, and the throughput of thestocker can remain essentially the same, despite the additional actionof detecting purge gas flow.

FIGS. 11A-11B illustrate sensor configurations on the gripper armsaccording to an embodiment of the present invention. In an embodiment,the sensor can be located at the front end of the robot arm, such as thegripper arm, so that the sensor can detect the flow before the carrierreaches the gas nozzle. In FIG. 11A, the gripper arms 110 can grip aearlier 111 by the edge. Sensors 112 can be disposed at the tips of thegripper arms 110, and can detect a side flow from nozzles 113 when thegripper arms moving past the gas nozzles 113. In an embodiment, thegripper arms can move so that the carrier 111 is aligned with the gasnozzles 113. In that movement direction, the flows from the nozzles canbe offset with the sensors 112. Alternatively, the gripper arms can moveto detect the flow, and then adjust the movements to align the carrierwith the nozzles.

In an embodiment, the sensors can be disposed alignedly with the nozzlesduring the movement path. In FIG. 11B, the gripper arms 110A can gripthe carrier 111A at an overhead handle 115, and therefore the sensors112A can be directly on top of the nozzles 113 when the gripper armsmove to place the carrier 111A on the nozzles 113.

FIGS. 12A-12D illustrate a flow detection sequence according to anembodiment of the present invention. The sequence shows gripper arms110A gripping a carrier 111A at a top handle 115. Sensors 112 can belocated at the ends of the gripper arms 110A. FIG. 12A shows the gripperarms 110A on the path to the place the carrier 111A on the storagelocation so that the carrier mates with the purge nozzles 113. On themovement path, the sensors 112 can be on top of the flow nozzles 113,and thus can detect whether or not a flow exists (FIG. 12B). Otherconfigurations are also possible, depending on the locations of thesensors, the flow nozzles and the path of the gripper arms. Upondetecting the presence of at least one flow (or all two flows, dependingon flow requirements for purging carriers), the gripper arms cancontinue the path, stopping when the nozzles are aligned with thecarrier (FIG. 12C). After alignment, the gripper arms can place thecarrier at the storage location, allowing the nozzles to provide purgegas to the inside volume of the carrier. The gripper arms can thenwithdraw (FIG. 12D).

This sequence describes a possible configuration of detecting nozzleflow on the path to place carrier. Other configurations can be used,such as detecting side flow, moving to detect nozzle flow beforecorrecting the path for carrier placement.

FIGS. 13A-13B illustrate flowcharts for sensing purge gas flow beforeplacing objects according to an embodiment of the present invention. InFIG. 13A, a robot arm can detect the presence of a gas flow at a storagelocation, and can identify that the storage location has purge gas flowsuitable for storing objects. The flow identification can be integratedto the object placement operation, identifying flow on the path ofobject placement. Operation 130 moves a robot arm to a storage location.Operation 131 senses, by a sensor on the gripper arm, a presence of agas flow at the storage location. Operation 132 identifies the storagelocation as having purge gas flow.

In FIG. 13B, a sequence of object placement can be performed by a robotarm having one or more integrated sensors. Operation 133 picks up, by agripper arm, a carrier. Operation 134 travels to a desired storagelocation. Operation 135 senses, on the path to the storage location, bya sensor on the gripper arm, a presence of a gas flow. Operation 136places the carrier to the desired storage location, if detecting a gasflow, so that the gas flows to the inside of the carrier. Operation 137transfers the carrier to another storage location if a gas flow is notdetected.

In some embodiments, the present invention discloses a robot fortransferring a workpiece. The robot can include a robot arm forsupporting a workpiece; one or more sensors coupled to a first end ofthe robot arm, wherein the sensors are operable to detect a gas flow; amoving mechanism coupled to a second end of the robot arm, wherein themoving mechanism is operable to move the robot arm.

In some embodiments, the robot arm forms a gripper for gripping theworkpiece. The robot can further include a mechanism for changing agripping distance of the robot arm. The workpiece can be supportedbetween the first end and the second end. The sensors can be configuredto detect an upward gas flow. The sensors can be configured to detect aside gas flow. The sensors can be configured to detect the gas flowduring a transfer of the workpiece to a destination.

In some embodiments, the present invention discloses a stocker forstoring workpieces. The stocker can include a storage chamber, whereinthe storage chamber comprises a plurality of compartments for storingthe workpieces, wherein the storage chamber comprises one or morenozzles for delivering a gas flow; a robot for transferring a workpieceto or from the storage chamber, wherein the robot comprises one or moresensors coupled to an end of the robot arm, wherein the sensors areoperable to detect a gas flow.

In some embodiments, the robot arm can form a gripper for gripping theworkpiece. The robot can include a mechanism for changing a grippingdistance of the robot arm. The workpiece can include a first containerfor storing an article, wherein the first container is stored within asecond container, and wherein the second container comprises an inletfor accepting a gas flow flowing to the volume between the firstcontainer and the second container. The sensors can be configured todetect an upward gas flow. The sensors can be configured to detect aside gas flow. The sensors can be configured to detect the gas flowduring a transfer of the workpiece to a compartment.

In some embodiments, the present invention discloses a method fortransferring a workpiece. The method can include supporting a workpieceby a robot arm; transferring the workpiece to a compartment, wherein thecompartment comprises a nozzle, wherein the nozzle is configured todeliver a gas flow; detecting the presence or absence of the gas flowduring the transferring of the workpiece to the compartment; placing theworkpiece to the compartment so that the nozzle is coupled to theworkpiece if the gas flow is detected.

In some embodiments, after a sensor at an end of a robot arm detects thepresence of a gas flow, the robot can continue to move to place theworkpiece to the compartment, wherein the workpiece is supported at amiddle of the robot arm. The gripper, formed by the robot arm, can bereleased to place the workpiece to the compartment.

In some embodiments, the method can further include transferring theworkpiece to another compartment if the gas flow is not detected;marking the compartment as defective if the gas flow is not detected;transferring the workpiece to a load port, wherein the load portcomprises a nozzle, wherein the nozzle is configured to deliver a gasflow; detecting the presence or absence of the gas flow during thetransferring of the workpiece to the load port; placing the workpiece tothe compartment so that the nozzle is coupled to the workpiece if thegas flow is detected.

In an embodiment, the present invention discloses a monitor object,which can be made of similar size and shape as objects to be stored in astocker. The monitor object can travels different storage locations tocollect data relating to the different storage locations, with respectto time and positions. For example, the monitor object can moves todifferent locations, identifying the purge gas flow characteristics atdifferent locations within the stocker. In addition, the monitor objectcan collect data related to time, providing a time evolution of thepurge gas characteristics.

In an embodiment, the monitor carrier can monitor the behavior of thepurge gas, such as whether or not a purge gas is present, what the purgegas flow is, the quality of the purge gas, the composition of the purgegas, the level of particles in the purge gas, and any othercharacteristics of the purge gas.

In an embodiment, the monitor carrier can monitor the behavior of theenvironment, such as the clean gas flow in the storage chamber. Themonitor carrier can detect the quality of the storage ambient, such asthe particle generation rate, the contaminant generation rate, the flowrate, and any other characteristics of the ambient. Other data can alsobe collected, such as temperature, cleanliness, particulates, etc.

FIG. 14A illustrates a monitor carrier according to an embodiment of thepresent invention. The monitor carrier 140 can have a shape and sizesimilar to other carriers, including handles to be picked up andreleased by a robot arm, and bottom surface to be placed on compartmentsupport. The monitor carrier can comprise a battery 142 to power theelectronics. The battery can be a rechargeable battery, but otherbattery types can be used. The monitor carrier can include one or moresensors 141A and 141B, for sensing a purge flow in the inside volume orto sense an outside ambient characteristics. The sensors can communicatethrough interface 143, for example, to load instructions and to unloaddata.

FIG. 14B illustrates movements of the monitor carrier is a stocker. Inan embodiment, the monitor carrier can be used during operation of thestocker, with a number of stored carriers 145 having reticles 146. Themonitor carrier 140 can be placed in an empty location, collecting dataat that location. Afterward, the monitor carrier can be moved to a newlocation, either another empty location 147, or a location made empty bymoving the occupied carrier to another location.

By moving the monitor carrier, location dependent data can be collected.For example, by correlating with the robot movements, the collected datacan be attributed to different locations in the stocker. Further, timedependent data can also be provided, for example, by correlating thedata with a time stamp or with the robot movements.

FIGS. 15A-15C illustrate flowcharts for data collecting from a monitorcarrier according to an embodiment of the present invention. In FIG.15A, one or more sensors can be coupled to a carrier shelf forcollecting data. Operation 150 provides a carrier shelf. Operation 151couples one or more sensors to the carrier shelf for collecting datarelated to ambient.

In FIG. 15B, data can be collected at empty locations in a stocker.Operation 152 transfers a monitor carrier to an empty storage locationin a stocker. Operation 153 collects data relating to the purge flow atthe empty storage location.

In FIG. 15C, collected data can be correlated with respect to time andpositions. Operation 154 transfers a monitor carrier to storagelocations in a stocker. Operation 155 collects data relating to thepurge flow at the storage locations in the stocker. Operation 156correlates data relating to the purge flow with respect to time andlocations.

In some embodiments, the present invention discloses a device formonitor conditions of a stocker, with the stocker configured to store aplurality of workpieces. The device can include one or more sensorscoupled to the outside surface or the inside of the device, wherein thedevice comprises similar size and shape of a workpiece; a memory coupledto the sensors for storing data collected by the sensors; a batterycoupled to the memory to power the memory.

In some embodiments, a sensor can be configured to detect a gas flow. Asensor can be configured to detect a quality of a gas flow. A quality ofa gas flow can include at least one of a composition of the gas flow,and a level of particles in the gas flow. A sensor can be configured todetect a characteristic of the ambient. The characteristic can includeat least one of temperature, cleanliness, and level of particulates. Thesensors can collect data as a function of time. A controller can beincluded to operate the sensors and the memory. An interface can beincluded for the sensors to communicate with a data processing system.

The above description describes a monitor carrier for used in a storagestocker. However, the invention is not so limited, and can be used forother systems, such as cleaner systems or processing systems to monitorsystem characteristics under operating conditions.

In an embodiment, the present invention discloses a station within asystem for accepting a monitor carrier. The station can provideinterfaces to the monitor carrier, for example, to transfer data andpower. In an embodiment, the station can include a mating interface, formating with the interface of the monitor carrier. Through the interface,power, for example, to charge a rechargeable battery in the monitorcarrier, and data, for example, to transfer collected data or to acceptinstructions, can be transferred between the station and the monitorcarrier. The station can be coupled to an electronic subsystem of thesystem, so that the data can be processed.

FIG. 16A illustrates a system including a data collection stationaccording to an embodiment of the present invention. A stocker caninclude storage chamber 160, a transfer module 161, loading andunloading station 162, control equipment 164, and a data collectionstation 163. The transfer module can transfer one or more monitorcarriers throughout the storage chamber 160, and to and from the datacollection station 163 for battery recharging and data transferring.From the data collection station, data can be transferred to theelectronic equipment, to be further processed and displayed.

In an embodiment, the present invention discloses a stocker for storingworkpieces. The stocker can include a storage chamber, wherein thestorage chamber comprises a plurality of compartments for storing theworkpieces, wherein the storage chamber comprises ono or more nozzlesfor delivering a gas flow; a robot for transferring a workpiece to orfrom the storage chamber; a station, wherein the station is operable tosupport a workpiece, wherein the station comprises an interface formating with a device, wherein the device comprises a size and shapesimilar to the workpiece.

In some embodiments, a controller can be coupled to the mating interfacefor processing data from the device. The device can collect data relatedto the stocker and to transfer to the interface. The data can include atleast one of a presence of a gas flow, a quality of a gas flow and acharacteristic of the ambient. A quality of a gas flow can include atleast one of a composition of the gas flow, and a level of particles inthe gas flow. The characteristic can include at least one oftemperature, cleanliness, and level of particulates. The device cancollect data as a function of time to transfer to the interface.

FIG. 16B illustrates a flowchart for data collection station accordingto an embodiment of the present invention. Operation 165 transfers amonitor carrier to a data station. Operation 166 couples electricalconnections between the monitor carrier and the data station. Operation167 uploads instructions to the monitor carrier (optional). Operation168 downloads data from the monitor carrier to a data processing system.Operation 169 charges battery in the monitor carrier (optional).

In some embodiments, the present invention discloses a method formonitoring conditions of a stocker, wherein the stocker is configured tostore a plurality of workpieces. The method can include transferring adevice to a storage compartment of the stocker, wherein the devicecomprises a size, and shape similar to the workpiece, wherein the deviceis configured to be transferred by the same mechanism as the workpiece,wherein the device is configured to be disposed in a storage compartmentas the workpiece; collecting data relating to a gas flow or an ambientby the device; transfer the device to another storage compartment.

In some embodiments, the method can include picking up the device from astation, wherein the station comprises an interface for transferringdata from the device; recharging a battery of the device at a station.The data relating to a gas flow or an ambient can include at least oneof a quality of a gas flow, a composition of the gas flow, a level ofparticles in the gas flow, a characteristic of the ambient, atemperature, a cleanliness, and a level of particulates.

In an embodiment, the present invention discloses a loading station foroverhead transport (OHT). Overhead transport typically runs overhead,connecting different process equipment within a fabrication facility.The overhead transport is also typically linear, running straight linesfrom one equipment to another equipment. Thus the overhead transportloading stations are normally linear, perpendicularly interfacing theoverhead transport line. In contrast, the manual loading stations aretypically radially positioned, interfacing a central point where a robotarm is located.

In an embodiment, the present invention discloses methods and systems torotate the objects in an overhead transport loading/unloading station,from a linear orientation to a radial orientation, facing a centralrobot arm. In an embodiment, the overhead loading station is disposed ata higher position than the manual loading station. A same robot can beused to access both manual loading stations and overhead loadingstations, with the robot travelling a vertical direction connecting thetwo loading stations. With the overhead loading stations re-oriented toface the central robot, accessing the objects in the overhead loadingstations can be simplified.

FIG. 17 illustrates an exemplary configuration for overhead and manualloading stations according to an embodiment of the present invention.Manual loading/unloading stations 171 and corresponding objects 172 areradially designed, facing the central robot 170A at the height of themanual loading stations. Overhead loading/unloading stations 173 arelinearly designed to accommodate overhead transport line 179. Aftertransferring from the overhead transport line 179, the objects arelinearly oriented 175. The overhead loading stations comprise arotational mechanism 174, rotating 177 the objects to radially face therobot 170B. As shown, the left and right objects are rotated indifferent directions. Other rotational directions are included,depending on the positions of the linear transport line and the positionof the central robot. Thus to access the objects, the robot moves in thez-direction from the manual loading station to the overhead loadingstation, the objects rotate from linear positions to radial positions,and the robot can access the rotated objects.

FIGS. 18A-18B illustrate exemplary flowcharts for accessing overheadloading stations according to an embodiment of the present invention. InFIG. 18A, robot moves up and carrier rotated to be oriented radially tobe picked up by the robot. Operation 180 rotates a carrier support sothat the carrier can be accessed by a OHT arm (optional). Operation 181receives a carrier on the carrier support by a OHT arm. Operation 182rotates the carrier support so that the carrier faces a central robotarm. Operation 183 moves the robot arm to appropriate height level(optional). Operation 184 picks up the carrier by the robot arm.

In FIG. 18B, robot moves up and places carrier on loading station.Loading station is then rotated to be oriented linearly to be picked upby the overhead transport. Operation 185 rotates a carrier support toface a central robot arm (optional). Operation 186 places a carrier onthe carrier support by the robot arm. Operation 187 rotates the carriersupport so that the carrier can be accessed by a OHT arm. Operation 188moves the robot arm to appropriate height level (optional). Operation189 receives a carrier in a OHT station.

In an embodiment, the present invention discloses loading and loadingstation for a cleaner system with nitrogen purge to the volume insidethe objects. To maintain a level of cleanliness for the object inside acarrier, the inside volume is constantly purged with inert gas such asnitrogen. Thus the present invention discloses an inert gas purge for atransfer and/or storage station, ensuring a constant purge of the insidevolume.

FIG. 19 illustrates an exemplary transfer and/or storage station havingpurge nozzles according to an embodiment of the present invention. Thedouble container carrier 190 is placed on nitrogen purge nozzles 194 inthe station 192. With the nitrogen nozzles 194 providing nitrogen 195 tothe bottom support of the double container carrier 190, the volumeinside the outer container is constantly purged with refreshed nitrogen.

In an embodiment, the present invention discloses a EUV stocker systemand process for storage of EUV carriers. The euv stocker systemcomprises one or more cleaning chambers (such as decontaminationchambers), purge gas storage stations and compartments, robot arm havingsensors for detecting purge gas operation, monitor carriers for datacollection in the stocker, monitor station for data and power transfer,rotating overhead loading station, and purge gas loading and unloadingstation.

What is claimed is:
 1. A method for decontaminating a workpiece, whereinthe workpiece comprises a first container for storing an article,wherein the first container is stored within a second container, themethod comprising transferring the workpiece to a first station, whereinthe first station is configured to decontaminate the workpiece;establishing a vacuum ambient within the first station; pumping volumebetween the first container and the second container; monitoring anoutgassing of the workpiece, wherein the outgassing is caused by thevacuum ambient and by the pumping; flowing an inactive gas to the firststation; flowing an active gas to the volume between the first containerand the second container; transferring the workpiece out of the firststation.
 2. A method as in claim 1, further comprising opening the firstcontainer.
 3. A method as in claim 1, further comprising opening thesecond container.
 4. A method as in claim 1, further comprisingtransferring the workpiece from a load port to the first station.
 5. Amethod as in claim 1, further comprising transferring the workpiece froma storage chamber to the first station.
 6. A method as in claim 1,further comprising transferring the workpiece from the first station toan unload port.
 7. A method as in claim 1, further comprisingtransferring the workpiece from the first station to a storage chamber.8. A method for storing a multi-compartment workpiece, wherein themulti-compartment workpiece comprise at least one compartment enclosingat least another compartment, the method comprising: transferring themulti-compartment workpiece to a storage compartment of a storagechamber having one or more nozzles; distributing a compartment inertingsystem to the one or more nozzles in the storage compartment; couplingthe compartment inerting system to an interior of the at least onecompartment that encloses the at least another compartment of themulti-compartment workpiece stored in the storage compartment; andinerting an enclosing volume defined between the at least onecompartment of the multi-compartment workpiece and the at least anothercompartment of the multi-compartment workpiece.
 9. The method of claim8, further comprising distributing the compartment inerting system toone or more nozzles in each storage compartment of the storage chamberand further coupling the one or more nozzles to the interior of the atleast one compartment.
 10. A method as in claim 9, further comprising:flowing the inactive gas to the one or more nozzles with or without theinterior of the at least one compartment coupling to the one or morenozzles.
 11. A method as in claim 9, further comprising: flowing theinactive gas to the one or more nozzles when the interior of the atleast one compartment is coupled to the one or more nozzles.
 12. Amethod as in claim 8, further comprising: delivering a laminar flow tothe storage compartment, wherein the laminar flow is provided from aside of the storage compartment.
 13. A method as in claim 8, furthercomprising: delivering a circulating flow to the storage compartmentthrough a raised floor.
 14. A method as in claim 8, further comprising:delivering the circulating flow through a chiller.